发明名称 Verfahren und Vorrichtung zum Polieren einer dünnen Platte
摘要 A method and an apparatus, for polishing a thin plate (1) comprises the steps of: rotating a holding plate (12) on one surface (12a) of which the thin plate (1) is held; and bringing the thin plate (1) into contact with a polishing pad (7) mounted on a surface of a rotating turn table (5). However, prior to this polishing step the said one surface (12a) of the holding plate (12) is polished using the said polishing pad (7). Preferably the said one surface (12a) is also made of a material having the same polishing properties as the thin plate (1). <IMAGE>
申请公布号 DE69711818(D1) 申请公布日期 2002.05.16
申请号 DE1997611818 申请日期 1997.11.21
申请人 SHIN-ETSU HANDOTAI CO., LTD. 发明人 TANAKA, KOICHI;TSUCHIYA, TOSHIHIRO;MORITA, KOJI;TAKAKU, TSUTOMU
分类号 B24B37/30;H01L21/304 主分类号 B24B37/30
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