发明名称 |
SEMICONDUCTOR DEVICE HAVING SILICON-ON-INSULATOR METAL-OXIDE-SEMICONDUCTOR TRANSISTOR AND APPARATUS FOR PROCESSING SIGNAL |
摘要 |
PURPOSE: A semiconductor device having a silicon-on-insulator(SOI) metal-oxide-semiconductor(MOS) transistor is provided to make the body of a main MOS transistor grounded and to reduce a leakage current in an off-state of the main MOS transistor, by connecting the body extending from the channel region of the main MOS transistor connected to an assistance MOS transistor and by electrically connecting a gate interconnection of the main MOS transistor with a gate interconnection of the assistance MOS transistor. CONSTITUTION: The main MOS transistor(100) includes the first gate interconnection receiving an outside signal, the first source/drain region(122) of the first conductivity and the body(108). The assistance MOS transistor(150) selectively switches the body to a floating or grounding state according to the outside signal, including the second gate interconnection, the second source/drain region(172) of the second conductivity type opposite to the first conductivity type. An interconnection layer(140) electrically connects the first gate interconnection with the second gate interconnection. |
申请公布号 |
KR20020036170(A) |
申请公布日期 |
2002.05.16 |
申请号 |
KR20000066212 |
申请日期 |
2000.11.08 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JUNG, MU GYEONG;KIM, BYEONG SEON |
分类号 |
H01L27/04;H01L21/822;H01L21/8238;H01L23/522;H01L27/02;H01L27/08;H01L27/092;H01L27/12;H01L29/78;H01L29/786;(IPC1-7):H01L29/78 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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