发明名称 SEMICONDUCTOR DEVICE HAVING SILICON-ON-INSULATOR METAL-OXIDE-SEMICONDUCTOR TRANSISTOR AND APPARATUS FOR PROCESSING SIGNAL
摘要 PURPOSE: A semiconductor device having a silicon-on-insulator(SOI) metal-oxide-semiconductor(MOS) transistor is provided to make the body of a main MOS transistor grounded and to reduce a leakage current in an off-state of the main MOS transistor, by connecting the body extending from the channel region of the main MOS transistor connected to an assistance MOS transistor and by electrically connecting a gate interconnection of the main MOS transistor with a gate interconnection of the assistance MOS transistor. CONSTITUTION: The main MOS transistor(100) includes the first gate interconnection receiving an outside signal, the first source/drain region(122) of the first conductivity and the body(108). The assistance MOS transistor(150) selectively switches the body to a floating or grounding state according to the outside signal, including the second gate interconnection, the second source/drain region(172) of the second conductivity type opposite to the first conductivity type. An interconnection layer(140) electrically connects the first gate interconnection with the second gate interconnection.
申请公布号 KR20020036170(A) 申请公布日期 2002.05.16
申请号 KR20000066212 申请日期 2000.11.08
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JUNG, MU GYEONG;KIM, BYEONG SEON
分类号 H01L27/04;H01L21/822;H01L21/8238;H01L23/522;H01L27/02;H01L27/08;H01L27/092;H01L27/12;H01L29/78;H01L29/786;(IPC1-7):H01L29/78 主分类号 H01L27/04
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