ION SOURCE AND OPERATION METHOD THEREOF

摘要

PURPOSE: An ion source and operation method are provided to improve the production efficiency of multiply charged ions in an ion source for increasing the ratio of multiply charged ions contained in an ion beam. CONSTITUTION: In the ion source, a rear reflector(10) is electrically insulated from a filament(6). The rear reflector(10) is electrically insulated from both a plasma production vessel(2) and the filament(6). The rear reflector(10) and an opposite reflector(8) are electrically connected by a conductor(30) and are placed in the same potential. Further, a DC bias power supply(32) is a power supply individuated from a filament power supply(24) and an arc power supply(26). The DC bias power supply(32) is placed for applying a DC bias voltage(VB) between the opposed reflector(8) and the rear reflector(10) and the plasma production vessel(2) with both the reflectors(8,10) as negative potential.