发明名称 Copper pad structure
摘要 A structure (and method) for a metallurgical structure includes a passivation layer, a via through the passivation layer extending to a metal line within the metallurgical structure, a barrier layer lining the via, a metal plug in the via above the barrier layer, the metal plug and the metal line comprising a same material, and a solder bump formed on the metal plug.
申请公布号 US2002056910(A1) 申请公布日期 2002.05.16
申请号 US20000526394 申请日期 2000.03.16
申请人 HOWELL WAYNE J.;MENDELSON RONALD L.;MOTSIFF WILLIAM T. 发明人 HOWELL WAYNE J.;MENDELSON RONALD L.;MOTSIFF WILLIAM T.
分类号 H01L23/52;H01L21/3205;H01L21/60;H01L23/485;(IPC1-7):H01L23/48;H01L29/40 主分类号 H01L23/52
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