发明名称 Exposure apparatus, maintenance method therefor, semiconductor device manufacturing method using the apparatus, and semiconductor manufacturing factory
摘要 Openings for transmitting ultraviolet rays are formed in a reticle stage (7) and a reticle surface plate (10) for supporting the reticle stage. A chuck groove (15) is formed in a reticle chuck surface (14) of a reticle holder (13). An opening for transmitting ultraviolet rays is also formed in the holder (13). An enclosure (17) for surrounding the ultraviolet path from the lower end of the stage (7) toward the vicinity of the reticle surface plate (10) is attached to the opening of the reticle stage (7). A supply port (16) for supplying purge gas made of inert gas into a space defined by a reticle (6), the stage (7), the enclosure (17), the surface plate (10), and a projection optical system (19) is formed.
申请公布号 US2002057422(A1) 申请公布日期 2002.05.16
申请号 US20010986918 申请日期 2001.11.13
申请人 ARAKAWA KIYOSHI 发明人 ARAKAWA KIYOSHI
分类号 G03F7/20;G03F7/22;H01L21/027;(IPC1-7):G03B27/52 主分类号 G03F7/20
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