发明名称 Edge border used for high voltage semiconductor component has the site of the bend and sealing of equipotential lines applied using a voltage in an insulating region
摘要 Edge border comprises: a semiconductor body (1) of one conducting type with semiconducting regions (2,3) on an edge surface region bordering a first main surface; and a field plate (4) arranged on the edge surface region and the first main surface. The site of the bend and sealing of equipotential lines (9) is applied using a voltage in an insulating region (6). An Independent claim is also included for a process for the production of an insulating region in a semiconductor body. Preferred Features: The insulating region is an insulating region extending vertically from the first main surface into the semiconductor body.
申请公布号 DE10051909(A1) 申请公布日期 2002.05.16
申请号 DE20001051909 申请日期 2000.10.19
申请人 INFINEON TECHNOLOGIES AG 发明人 AHLERS, DIRK;DETZEL, THOMAS;FRIZA, WOLFGANG;RUEB, MICHAEL
分类号 H01L29/06;H01L29/40;(IPC1-7):H01L29/06 主分类号 H01L29/06
代理机构 代理人
主权项
地址