发明名称 |
Emission monitoring system and method |
摘要 |
An emission measuring system and method provide an accurate, real-time calculation of a particular material emitted from an emission source. Specifically, a CEM system installed in an industrial stack can include a dilution probe located in the stack and a data analyzer that records and analyzes characteristic data of the materials sampled by the dilution probe. A dilution ratio is used to correct for the addition of dilution gas into the stack gas sample to determine the concentration of a particular material that is being emitted from the stack. The dilution ratio is based on a molar flow rate, which can be determined by using specific algorithms and measurements.
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申请公布号 |
US2002059033(A1) |
申请公布日期 |
2002.05.16 |
申请号 |
US20010844282 |
申请日期 |
2001.04.30 |
申请人 |
PPL ELECTRIC UTILITIES CORP. |
发明人 |
BATUG JAMES P.;ROMERO CARLOS E.;YILMAZ ALI;LEVY EDWARD K.;MOYER NOEL |
分类号 |
G01N1/22;G01N33/00;(IPC1-7):G06F19/00;G01N31/00 |
主分类号 |
G01N1/22 |
代理机构 |
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代理人 |
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主权项 |
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