发明名称 Emission monitoring system and method
摘要 An emission measuring system and method provide an accurate, real-time calculation of a particular material emitted from an emission source. Specifically, a CEM system installed in an industrial stack can include a dilution probe located in the stack and a data analyzer that records and analyzes characteristic data of the materials sampled by the dilution probe. A dilution ratio is used to correct for the addition of dilution gas into the stack gas sample to determine the concentration of a particular material that is being emitted from the stack. The dilution ratio is based on a molar flow rate, which can be determined by using specific algorithms and measurements.
申请公布号 US2002059033(A1) 申请公布日期 2002.05.16
申请号 US20010844282 申请日期 2001.04.30
申请人 PPL ELECTRIC UTILITIES CORP. 发明人 BATUG JAMES P.;ROMERO CARLOS E.;YILMAZ ALI;LEVY EDWARD K.;MOYER NOEL
分类号 G01N1/22;G01N33/00;(IPC1-7):G06F19/00;G01N31/00 主分类号 G01N1/22
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