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发明名称
Verfahren und Vorrichtung zur photothermischen Analyse einer Materialschicht, insbesondere zur Schichtdickenmessung
摘要
申请公布号
DE10013172(C2)
申请公布日期
2002.05.16
申请号
DE20001013172
申请日期
2000.03.17
申请人
WAGNER INTERNATIONAL AG, ALTSTAETTEN
发明人
SCHEIDT, MICHAEL;MOSER, HANSRUEDI;ADAMS, HORST
分类号
G01B15/02;G01B11/06;G01N21/84;(IPC1-7):G01N25/72
主分类号
G01B15/02
代理机构
代理人
主权项
地址
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