COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM

摘要

PURPOSE: To provide a composition for the formation of an antireflection film to form an antireflection film between a photoresist layer and a substrate such that even when excimer laser light or the like is used as the light source for superior microfabrication, a photoresist patter having a square cross-sectional form can be formed on a substrate without causing phenomena of trailing, constriction or the like appearing in the lower part of a pattern. CONSTITUTION: The composition for the formation of an antireflection film contains an acidic compound and at least one kind of crosslinking agent selected from nitrogen-containing compounds having amino groups at least two hydrogen atoms of which are substituted by a hydroxyalkyl group and/or a alkoxyalkyl group. In the crosslinking agent, the proportion of trimers, dimers and monomers is controlled to < =15 wt.%.