APPARATUS FOR LOADING BRUSH FOR CLEANING WAFER

摘要

PURPOSE: An apparatus for loading a brush for cleaning a wafer is provided to reduce an exchanging time of a brush by using a loading device for loading the brush on a support portion. CONSTITUTION: A brush(300) is supported by the first loading portion(10) and the third loading portion(20). The brush(300) is inserted into a support portion(400). The first loading portion(10) and the third loading portion(20) are practically inserted into the support portion(400) since the brush(300) is supported by the first loading portion(10) and the third loading portion(20). A plurality of pin are inserted into the support portion(400). The brush(300) is inserted into the support portion(400) by using the second loading portion(30). The third loading portion(20) and the first loading portion are ejected therefrom. Accordingly, the brush(300) is supported by the support portion(400).