发明名称 |
Liquid processing apparatus |
摘要 |
A cleaning processing apparatus, which is one embodiment of a liquid processing apparatus for performing a liquid processing by supplying a predetermined process liquid to a target object to be processed such as a semiconductor wafer while rotating the target object, comprises a rotor for holding wafers W, a slidable process section for housing the rotor, and a cleaning liquid spurting nozzle for supplying a predetermined cleaning liquid to the wafers W. A housing for housing the slidable process section is of a hermetic structure so as to be substantially shielded from the outside.
|
申请公布号 |
US2002056471(A1) |
申请公布日期 |
2002.05.16 |
申请号 |
US20010987369 |
申请日期 |
2001.11.14 |
申请人 |
KAMIKAWA YUJI;EGASHIRA KOJI |
发明人 |
KAMIKAWA YUJI;EGASHIRA KOJI |
分类号 |
B08B3/02;H01L21/00;(IPC1-7):B08B3/02 |
主分类号 |
B08B3/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|