发明名称 |
A PROCESS AND AN APPARATUS FOR THE FORMATION OF PATTERNS IN FILMS USING TEMPERATURE GRADIENTS |
摘要 |
The present invention relates to a process and an apparatus for producing patterns, particularly high-resolution patterns, in films which are exposed to temperature gradients. In particular, there is provided a process for producing lithographic structures by exposing at least one film on a substrate to a temperature gradient, the temperature gradient generating forces in the film which cause a mass transfer in the film to thereby produce a lithographic pattern.
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申请公布号 |
CA2428118(A1) |
申请公布日期 |
2002.05.16 |
申请号 |
CA20012428118 |
申请日期 |
2001.11.08 |
申请人 |
APPLIED NANOSYSTEMS B.V. |
发明人 |
STEINER, ULLRICH;SCHAFFER, ERIK |
分类号 |
B81C99/00;B41C1/10;B41M5/26;B41M5/36;B82B3/00;G05D23/19;H01L21/027;(IPC1-7):B41M5/36 |
主分类号 |
B81C99/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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