发明名称 A PROCESS AND AN APPARATUS FOR THE FORMATION OF PATTERNS IN FILMS USING TEMPERATURE GRADIENTS
摘要 The present invention relates to a process and an apparatus for producing patterns, particularly high-resolution patterns, in films which are exposed to temperature gradients. In particular, there is provided a process for producing lithographic structures by exposing at least one film on a substrate to a temperature gradient, the temperature gradient generating forces in the film which cause a mass transfer in the film to thereby produce a lithographic pattern.
申请公布号 CA2428118(A1) 申请公布日期 2002.05.16
申请号 CA20012428118 申请日期 2001.11.08
申请人 APPLIED NANOSYSTEMS B.V. 发明人 STEINER, ULLRICH;SCHAFFER, ERIK
分类号 B81C99/00;B41C1/10;B41M5/26;B41M5/36;B82B3/00;G05D23/19;H01L21/027;(IPC1-7):B41M5/36 主分类号 B81C99/00
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