发明名称 |
ARRANGEMENT ENABLING A LIQUID TO FLOW EVENLY AROUND A SURFACE OF A SAMPLE AND USE OF SAID ARRANGEMENT |
摘要 |
<p>The invention relates to an arrangement enabling a liquid ( 2 ) to flow evenly around a surface of a sample ( 3 ); said arrangement has a flow chamber ( 1 ) through which a liquid ( 2 ) flows via inflow and outflow pipes ( 7, 8 ). The sample ( 3 ) can be rotated about an axis of rotation by means of a rotary drive ( 5 ). A filter ( 13 ) which extends crosswise to the direction of flow of the liquid ( 2 ) and which ensures a uniform flow through the inflow and outflow pipes ( 7, 8 ) is situated in front of the inflow and outflow pipes ( 7, 8 ). The arrangement is especially suitable for depositing a homogeneous layer of a nickel/iron alloy on a silicon wafer ( 3 ). The invention relates furthermore to the use of the arrangement.</p> |
申请公布号 |
EP1204786(A1) |
申请公布日期 |
2002.05.15 |
申请号 |
EP20000963895 |
申请日期 |
2000.08.10 |
申请人 |
TYCO ELECTRONICS LOGISTICS AG |
发明人 |
HOSTEN, DANIEL;SCHMIDT, HELGE;SCHWAB, MICHAEL |
分类号 |
C25D5/08;C25D7/12;(IPC1-7):C25D5/08;H01L21/28 |
主分类号 |
C25D5/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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