发明名称 |
Method for monitoring and/or controlling the status of a plasma in a plasma spectrometer and spectrometer for implementing such a method |
摘要 |
A method for monitoring and/or controlling the positioning and/or condition of a plasma in a plasma spectrometer, which comprises: acquiring image data of the plasma through a video-camera (7), and a) displaying on a display device (10) a plasma image from the aquired image data; and/or b) storing the image data in a computer unit (9). Application to inductively coupled high frequency plasma optical emission and mass spectrometers. <IMAGE> |
申请公布号 |
EP1205962(A1) |
申请公布日期 |
2002.05.15 |
申请号 |
EP20000403139 |
申请日期 |
2000.11.10 |
申请人 |
JOBIN YVON S.A. |
发明人 |
UKON, JUICHIRO;DANTHEZ, YVES |
分类号 |
G01J3/04;G01N27/62;G01J3/443;G01N21/73;H01J49/10;H05H1/00 |
主分类号 |
G01J3/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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