发明名称 Method for monitoring and/or controlling the status of a plasma in a plasma spectrometer and spectrometer for implementing such a method
摘要 A method for monitoring and/or controlling the positioning and/or condition of a plasma in a plasma spectrometer, which comprises: acquiring image data of the plasma through a video-camera (7), and a) displaying on a display device (10) a plasma image from the aquired image data; and/or b) storing the image data in a computer unit (9). Application to inductively coupled high frequency plasma optical emission and mass spectrometers. <IMAGE>
申请公布号 EP1205962(A1) 申请公布日期 2002.05.15
申请号 EP20000403139 申请日期 2000.11.10
申请人 JOBIN YVON S.A. 发明人 UKON, JUICHIRO;DANTHEZ, YVES
分类号 G01J3/04;G01N27/62;G01J3/443;G01N21/73;H01J49/10;H05H1/00 主分类号 G01J3/04
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