发明名称 Composition for vapor deposition, method for forming antireflection film using it, and optical element
摘要 <p>It is an object of the invention to provide a method for producing an optical element having a multi-layered antireflection film formed on a synthetic resin substrate, in which the antireflection film formed has good heat resistance, and its heat resistance lowers little with time. The method makes it possible to form high-refraction layers within a shorter period of time, not detracting from the good physical properties intrinsic to the layers. &lt;??&gt;At least one high-refraction layer of the multi-layered anti-reflection film contains niobium oxide, zirconium oxide, yttrium oxide, and optionally aluminum oxide.</p>
申请公布号 EP1205774(A2) 申请公布日期 2002.05.15
申请号 EP20010126520 申请日期 2001.11.13
申请人 HOYA CORPORATION 发明人 MITSUISHI, TAKESHI;KAMURA, HITOSHI;SHINDE, KENICHI;TAKEI, HIROKI;KOBAYASHI, AKINORI;TAKAHASHI, YUKIHIRO;WATANABE, YUKO
分类号 G02C7/02;B32B9/00;C23C14/08;C23C14/24;G02B1/10;G02B1/11;(IPC1-7):G02B1/11 主分类号 G02C7/02
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