发明名称 |
Projection exposure apparatus |
摘要 |
A scan type projection exposure apparatus which includes an illumination optical system for forming a slit-shaped illumination area on a pattern on a mask by using illuminating light, and a projection optical system for forming an image of a portion of the pattern in the illumination area on a substrate, includes: a mask stage which moves at least in one direction while holding the mask; a substrate stage which moves two-dimensionally while holding the substrate; a control system for synchronously scanning the mask stage and the substrate stage; and an image forming performance adjusting system for adjusting image forming performance of the projection optical system and having a component placed in an area through which the illuminating light incident from the illumination area on the mask to the projection optical system does not pass.
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申请公布号 |
US6388734(B1) |
申请公布日期 |
2002.05.14 |
申请号 |
US19990370212 |
申请日期 |
1999.08.09 |
申请人 |
NIKON CORPORATION |
发明人 |
TOKUDA NORIAKI;NISHI KENJI |
分类号 |
G02B27/00;G03F7/20;(IPC1-7):G03B27/42;G03B27/68 |
主分类号 |
G02B27/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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