发明名称 |
TITANIUM OXIDE FILM AND ITS FORMING METHOD AND APPARATUS FOR PHOTODEGRADATION TREATMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a titanium oxide film which contains a low hydrogen overvoltage metal formed by the hydrolysis of a titanium alkoxide or by the burning of the low hydrogen overvoltage metal compound or a titanium sol which contains a silicate or a silica sol. SOLUTION: The above titanium oxide film has a high photocatalytic property. A base substance forming the titanium oxide film is set without a specific jig and with space-saving. An apparatus for photodegradation treatment is simple and compact and capable of exhibiting high photocatalytic property. |
申请公布号 |
JP2002137921(A) |
申请公布日期 |
2002.05.14 |
申请号 |
JP20000324880 |
申请日期 |
2000.10.25 |
申请人 |
C UYEMURA & CO LTD |
发明人 |
SAIJO YOSHIJI;SUZUKI YOSHIHIRO;MURAKAMI TORU |
分类号 |
C02F1/30;B01D53/86;B01J23/42;B01J23/44;B01J23/52;B01J35/02;B01J35/06;B01J37/02;C01B33/12;C01G23/04;C02F1/72 |
主分类号 |
C02F1/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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