发明名称 COSMETIC MATERIAL COMPOSITION FOR ATOPIC SKIN USING MUGWORT EXTRACT
摘要 PURPOSE: Provided is a cosmetic material composition for atopic skin using mugwort extract. The cosmetic material composition maintains the moisture of skin, prevents the second fungi propagation of atopic skin inflammation, and decreases the transepidermal water loss as well as giving no skin irritation and easing itchiness. CONSTITUTION: The composition comprises containing 0.1-5wt.% of the mugwort extract based on the whole composition which is prepared by extracting mugwort by using the mixed solvent of ethyl alcohol, 1,3-butylene glycol and water in a weight ratio of 1:1:1-1:5:8.
申请公布号 KR20020035322(A) 申请公布日期 2002.05.11
申请号 KR20000065564 申请日期 2000.11.06
申请人 AE KYUNG INDUSTRIAL CO., LTD. 发明人 KONG, U SIK;LEE, GI MU;LEE, JEONG SUK;SEO, CHUNG SEOK
分类号 (IPC1-7):A61K7/40 主分类号 (IPC1-7):A61K7/40
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