发明名称 PERFORMANCE EVALUATION METHOD, MAINTENANCE METHOD, PERFORMANCE MANAGEMENT SYSTEM, AND PERFORMANCE CONFIRMATION SYSTEM OF PLASMA TREATMENT DEVICE OR PLASMA TREATMENT SYSTEM, AND PLASMA TREATMENT DEVICE
摘要 PURPOSE: To be able to evaluate simply and promptly whether a requested performance is maintained or not after a plasma treatment device is decomposed and rebuilt after carrying. CONSTITUTION: A plasma treatment chamber 60 having an electrode 4 to excite plasma, a high-frequency power supply 1 connected to the electrode 4, a matching circuit 2 to gain an impedance alignment of the plasma chamber 60 and the high-frequency power supply 1, are equipped. Performance is evaluated as to whether the value Cx1 after delivery of capacity Cx between the connected electrode 4 of the high-frequency power supply 1 of the plasma treatment chamber 60 and each grounding potential part grounded as direct current, is smaller than twenty six times the plasma electrode capacity Ce between the electrode 4 and an electrode 8 generating plasma in cooperation with the electrode 4.
申请公布号 KR20020035463(A) 申请公布日期 2002.05.11
申请号 KR20010068771 申请日期 2001.11.06
申请人 ALPS ELECTRIC CO., LTD.;OHMI TADAHIRO 发明人 NAKANO AKIRA;OHMI TADAHIRO
分类号 H05H1/00;C23C16/509;C23C16/52;H01J37/32;H01L21/02;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):H05H1/00 主分类号 H05H1/00
代理机构 代理人
主权项
地址