发明名称 |
PERFORMANCE EVALUATION METHOD, MAINTENANCE METHOD, PERFORMANCE MANAGEMENT SYSTEM, AND PERFORMANCE CONFIRMATION SYSTEM OF PLASMA TREATMENT DEVICE OR PLASMA TREATMENT SYSTEM, AND PLASMA TREATMENT DEVICE |
摘要 |
PURPOSE: To be able to evaluate simply and promptly whether a requested performance is maintained or not after a plasma treatment device is decomposed and rebuilt after carrying. CONSTITUTION: A plasma treatment chamber 60 having an electrode 4 to excite plasma, a high-frequency power supply 1 connected to the electrode 4, a matching circuit 2 to gain an impedance alignment of the plasma chamber 60 and the high-frequency power supply 1, are equipped. Performance is evaluated as to whether the value Cx1 after delivery of capacity Cx between the connected electrode 4 of the high-frequency power supply 1 of the plasma treatment chamber 60 and each grounding potential part grounded as direct current, is smaller than twenty six times the plasma electrode capacity Ce between the electrode 4 and an electrode 8 generating plasma in cooperation with the electrode 4.
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申请公布号 |
KR20020035463(A) |
申请公布日期 |
2002.05.11 |
申请号 |
KR20010068771 |
申请日期 |
2001.11.06 |
申请人 |
ALPS ELECTRIC CO., LTD.;OHMI TADAHIRO |
发明人 |
NAKANO AKIRA;OHMI TADAHIRO |
分类号 |
H05H1/00;C23C16/509;C23C16/52;H01J37/32;H01L21/02;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):H05H1/00 |
主分类号 |
H05H1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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