发明名称 FOCUSED ION BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To settle problems on performances such as shortage of an analyzing means, absence of a verifying function of a analysis result, a large dependence on a sample and the like in the case that an optical system automatic correction device of a charged particle beam device is applied to a focusing ion beam(FIB) device. SOLUTION: A shaft displacement, a focus position displacement, and an astigmatism are automatically corrected based on positional displacement variables among images of a scanning ion microscope(SIM) taken under various conditions set on a FIB lens, a correcting deflector, a beam limitation aperture or the like. Since an analyzing method based on the displacement variables less depends on the sample, its applicable range is enlarged in such a case that a beam current is changed, or a drift by an ion gun occurs. By adopting this positional displacement analyzing method, a device correction accuracy is improved by one digit. A reliability on the positional displacement analyzing result is verified with an extent of coincidence, which enables an unattended operation in which a wrong operation preventing flow is added.
申请公布号 JP2002134059(A) 申请公布日期 2002.05.10
申请号 JP20000333535 申请日期 2000.10.27
申请人 HITACHI LTD 发明人 FUKUDA MUNEYUKI;SHICHI HIROYASU;TOMIMATSU SATOSHI;TOKIDA RURIKO;ISHITANI SUSUMU
分类号 H01J37/04;H01J37/147;H01J37/21;H01J37/317;(IPC1-7):H01J37/317 主分类号 H01J37/04
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