| 摘要 |
PROBLEM TO BE SOLVED: To surely suppress generation of corrosion by effectively removing halogens (chlorine, fluorine, or the like) which remain on a semiconductor substrate. SOLUTION: An aqueous solution, which contains at least one kind selected from quaternary ammonium hydroxide, quaternary ammonium carbonate, and quaternary ammonium bicarbonate as a cleaning ingredient, is used as a cleaning agent for semiconductor devices. The ratio of the cleaning ingredient is 0.0001-10 wt.%. An anticorrosive of 5 wt.% or lower may be contained. The pH value of the cleaning agent is 7-11. Prior to the cleaning with this cleaning agent, cleaning with a cleaning agent containing a fluorine compound of 0.1-10 wt.%, a water-soluble organic solvent of 50-90 wt.%, and water for the remainder may be applied.
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