发明名称 A PROBE ASSEMBLY FOR DETECTING AN ION IN A PLASMA GENERATED IN AN ION SOURCE
摘要 A method and apparatus relating to an ion implantation system (10) that employs an ion source (12) for generating a plasma having an ion, and a probe assembly (30) for detecting the ion of the plasma is provided. The probe assembly (30) includes a probe body (36) and a focusing device (60) for extracting the ion from the plasma, and a filter (40) for filtering ions extracted from the plasma.
申请公布号 WO0237525(A2) 申请公布日期 2002.05.10
申请号 WO2001GB04724 申请日期 2001.10.24
申请人 AXCELIS TECHNOLOGIES, INC.;EATON LIMITED 发明人 BENVENISTE, VICTOR, MAURICE
分类号 H01J27/02;H01J37/08;H01J37/32 主分类号 H01J27/02
代理机构 代理人
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