ELECTRON BEAM APPARATUS AND DEVICE PRODUCTION METHOD USING THE APPARATUS

摘要

An electron beam apparatus which has its throughput, accuracy and the like improved, and which comprises a plurality of optical systems each including a primary electron optical system for irradiating for scanning a sample with a plurality of primary electron beams, a detector for detecting a plurality of secondary electron beams generated by the irradiation of the sample with the primary electron beams, and a secondary electron optical system for guiding the secondary electron beams from the sample to the detector, characterized in that each of the plurality of optical systems is disposed so as to scan mutually different areas on the sample with primary electron beams to detect secondary electron beams respectively generated from these areas, thereby enabling a high throughput. Various methods are used in aligning optical systems and correcting aberration in the apparatus for the purpose of enhancing accuracy.