| 发明名称 |
HIGH-MOLECULAR COMPOUNDS FOR PHOTORESISTS, MONOMERIC COMPOUNDS, PHOTOSENSITIVE RESIN COMPOSITIONS, METHOD FOR FORMING PATTERNS WITH THE COMPOSITIONS, AND PROCESS FOR PRODUCTION OF ELECTRONIC COMPONENTS |
| 摘要 |
High-molecular compounds for photoresists, each having at least one skeleton represented by the general formula (1), (2A), (2B), or (2C): (1) (2A) (2B) (2C) wherein R is an alicyclic skeleton; and at least one of R<x1>s is an electron-attracting group and the others may be the same or different from each other and are each hydrogen or a monovalent organic group.
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| 申请公布号 |
WO0236646(A1) |
申请公布日期 |
2002.05.10 |
| 申请号 |
WO2001JP09567 |
申请日期 |
2001.10.31 |
| 申请人 |
KABUSHIKI KAISHA TOSHIBA;SHIDA, NAOMI;USHIROGOUCHI, TORU;NAITO, TAKUYA |
发明人 |
SHIDA, NAOMI;USHIROGOUCHI, TORU;NAITO, TAKUYA |
| 分类号 |
C08F16/00;C08F24/00;C08F28/00;C08F32/00;C08F32/08;C08F34/02;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):C08F32/08 |
主分类号 |
C08F16/00 |
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