| 摘要 |
<p>A coating film (102) is formed on a substrate (101) of sapphire by coating the substrate with a jointing material prepared by mixing and dissolving Al(OC2H5) and B(OCH3) into xylene. The substrate (101) is heated to about 450°C and the coating film (102) is irradiated with, e.g., ultraviolet radiation having a wavelength of 172 nm. Thus, the xylene in the coating film (102) is vaporized, and the Al(OC2H5) and B(OCH3) are thermally dissociated. As a result, a jointing material composed of amorphous or η-phase alumina (Al2O3) and amorphous boron oxide (B2O3) is manufactured.</p> |
