发明名称 METHOD FOR SYNTHESIZING MASK DATA, METHOD FOR INSPECTING MASK DATA, AND SEMICONDUCTOR INTEGRATED DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a method for synthesizing a mask data where the check of mutual connection terminals is unnecessary about the mask data in which the mask data of a plurality of macro-blocks is synthesized, and to provide a method for inspecting the mask data and a semiconductor integrated device using them. SOLUTION: In a G/A interface cell region 50 provided at an inner part of a hard macro-arrangement region 40 of a chip 10, and in a hard macro IF cell region 80 provided at a hard macro-peripheral part, shrank and arranged at the hard macro-arrangement region 40, the IF cell provided corresponding to the hard macro-connection terminal is constituted of the connection pad constituted of the given wiring layers of the same shape, and a connection pad of the G/A interface cell region 50 and a connection pad of the hard macro- arrangement region 40 are arranged so as to overlap each other.</p>
申请公布号 JP2002134621(A) 申请公布日期 2002.05.10
申请号 JP20000329927 申请日期 2000.10.30
申请人 SEIKO EPSON CORP 发明人 KONUMA FUMIKO
分类号 G03F1/68;G03F1/70;G06F17/50;H01L21/82;(IPC1-7):H01L21/82;G03F1/08 主分类号 G03F1/68
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