| 摘要 |
<p>PROBLEM TO BE SOLVED: To reduce particles which occur after chucking a work on an electrostatic chuck. SOLUTION: The electrostatic chuck apparatus 1 for chucking the work 7 is provided. The apparatus 1 is equipped with a base body 5 and protruding parts 3 which are provided on the surface 2 of the base body 5. The protruding parts 3 are equipped with dielectric parts 3a for chucking the work 7 by touching it, and a stress relaxing part 3b which is displaceable at least at the temperature at the time of chuck.</p> |
