| 发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION |
| 摘要 |
A photosensitive resin composition containing an alkali- soluble resin and a photosensitive agent containing a quinoneazide group, characterized in that the photosensitive agent comprises a mixture of two or more esters from tetrahydroxybenzophenone and 1,2-naphthoquinonediazide sulfonic acid, which esters have different average degrees of esterification. The photosensitive agent preferably comprises a photosensitive agent (A) which is an ester from tetrahydroxybenzophenone and 1,2-naphthoquinonediazide-5-sulfonic acid having an average degree of esterification of X % (50 </= X </= 100) and a photosensitive agent (B) which is an ester from the same components as those in the case of (A) having an average degree of esterification of Y % (25 </= Y </= (X - 10)), in a A:B mixing ratio of 10 to 90 : 90 to 10. |
| 申请公布号 |
WO0237185(A1) |
申请公布日期 |
2002.05.10 |
| 申请号 |
WO2001JP08924 |
申请日期 |
2001.10.11 |
| 申请人 |
CLARIANT INTERNATIONAL LTD.;TAKAHASHI, SHUICHI;IKEMOTO, JUN;SHIODA, HIDEKAZU;KAWATO, SHUNJI |
发明人 |
TAKAHASHI, SHUICHI;IKEMOTO, JUN;SHIODA, HIDEKAZU;KAWATO, SHUNJI |
| 分类号 |
C08K5/07;C08K5/42;C08L101/00;G03F7/022;G03F7/023;H01L21/027;(IPC1-7):G03F7/022 |
主分类号 |
C08K5/07 |
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