| 摘要 |
PROBLEM TO BE SOLVED: To provide a CMOS image sensor, capable of forming a convex color film pattern used as a microlens and of improving optical transmission characteristics, and to provide a method of manufacturing the CMOS image sensor. SOLUTION: The CMOS image sensor includes a semiconductor structure supplied by a series of processes, an insulating film 34 which is formed on the semiconductor structure and has a trench 35, and a convex color filter pattern 36A which is formed on the insulating film 34 and covers the trench 35. |
