发明名称 PLASMA PROCESSING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a plasma processing system, in which an insulating plate having a not so high a thermal conductivity, can be cooled efficiently. SOLUTION: The plasma processing system comprises a processing container 32, which can be evacuated by opening the ceiling part, an insulating plate 72 fixed airtightly to the ceiling opening of the processing container, a table 34 for mounting an article W to be processed disposed in the processing container, a planar antenna member 76 disposed above the insulating plate and introducing microwaves for generating plasma from a plurality of microwave radiation holes 90 made at a prescribed pitch through the insulating plate into the processing container, and a gas-supply means 48 for introducing a prescribed gas into the processing container wherein the insulating plate is split into a plurality of split pieces each supported, at the periphery thereof, by a support frame member 73 having a channel 100 for feeding a heating medium. According to the arrangement, insulating plate having not so high a thermal conductivity can be cooled efficiently.
申请公布号 JP2002134417(A) 申请公布日期 2002.05.10
申请号 JP20000322096 申请日期 2000.10.23
申请人 TOKYO ELECTRON LTD 发明人 HONGO TOSHIAKI
分类号 H05H1/46;B01J19/08;C23C16/50;C23C16/511;H01J37/32;H01L21/00;H01L21/205;H01L21/302;H01L21/3065 主分类号 H05H1/46
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