| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method for plasma processing, capable of preventing an abnormal electric discharging by preventing generation of impurities from the wall surface of a chamber, and stabilizing the plasma. SOLUTION: The apparatus 1 for plasma processing comprises the chamber, made of a conductor such as Al or the like for shutting off the internal atmosphere from the outside air, a bell-jar made of a quartz and covering the inner wall of the chamber, a plasma generating region of a part in the bell-jar, and an exposure/shield controller 9, capable of taking a state in which the conductor part is exposed with a part of the generating region and in a state which is shielded from the generating region at the conductor part by the insulator part. The method for plasma processing using the apparatus 1 is provided. |
