发明名称 HIGH STRENGTH MONOCHROME ATOM BEAM SOURCE
摘要 PROBLEM TO BE SOLVED: To provide an atom beam source wherein atom generation with high dissociation coefficient is realized for stably outputting high-purity and high- intensity monochrome atom beam for an extended period. SOLUTION: There are provided a discharge part (1) in which the atom flow is generated by plasma-igniting the discharge gas guided into a quartz glass tube (6) covered with a microwave (5) using microwave irradiation with the microwave cavity (5), a discharge gas guiding part (2) which guides the gas to the discharge part (1), a cooling part (3) which cools the discharge part (1), and a transportation part (4) which, having a tubular structure, transports the atom flow generated at the discharge (1) as far as a skimmer in a differential exhausting device. At the discharge part (1), both end parts of the quartz glass tube (6) are drawn so that the diameters at them are smaller than the diameter at the parts other than both end parts. Related to the transportation part (4), the inside wall is coated with a fluorinated resin while the temperature of the discharge part, at the cooling part, is allowed to be a constant temperature or below at always.
申请公布号 JP2002134041(A) 申请公布日期 2002.05.10
申请号 JP20000321251 申请日期 2000.10.20
申请人 NATIONAL INSTITUTE FOR MATERIALS SCIENCE 发明人 KITAJIMA MASAHIRO;KUBO ATSUSHI
分类号 H01J27/02;H01J27/16;H01J37/08;(IPC1-7):H01J27/02 主分类号 H01J27/02
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