| 摘要 |
<p>A positive photosensitive resin composition having high sensitivity is provided which can form patterns with high resolution and high film thickness retention and can give by curing film excellent in mechanical characteristics, adhesion, and water absorption. This composition comprises 100 parts by weight of an alkali-soluble resin, 1 to 100 parts by weight of a photosensitive diazoquinone compound (B) and a filler (C), the content (F) of the filler (C) as defined by the following formula ranging from 2 to 70 wt %. F = filler (C) / (alkali-soluble resin + filler (C))</p> |
