| 摘要 |
<p>A method and apparatus relating to an ion implantation system (10) that employs an ion source (12) for generating a plasma having an ion, and a probe assembly (30) for detecting the ion of the plasma is provided. The probe assembly (30) includes a probe body (36) and a focusing device (60) for extracting the ion from the plasma, and a filter (40) for filtering ions extracted from the plasma.</p> |
