发明名称 CONTROL OF DEPOSITION AND OTHER PROCESSES
摘要 <p>A system for incrementally depositing material includes a delivery system for directing a material toward a deposition zone (5), a monitoring system for monitoring a parameter of the deposited (a) material and a processing system (11) arranged to obtain a monitored value for the parameter, derive a predicted future parameter value for the monitored parameter, compare the predicted value with a reference parameter value for the monitored parameter, and produce a control output based on the comparison of the predicted value with the reference value, the control output being capable of modifying operation of the system. The parameter monitored has the tendency to vary over time (and space), and the processing means ensure that control output is not based upon the difference between an originally monitored parameter value and a reference value but rather between a prediction generated value (accouting for passage of time or spacital difference) and the reference value. This provides for more accurate process control.</p>
申请公布号 WO2002036845(A1) 申请公布日期 2002.05.10
申请号 GB2001004840 申请日期 2001.10.31
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