发明名称 |
EXCIMER UV PHOTO REACTOR |
摘要 |
<p>An excimer UV photo reactor which has a reactive gas supplying means (1) for supplying a reactive gas (C) only to an active region (A1) on a body (A) to be irradiated. In the excimer UV photo reactor, a photochemical reaction of the reactive gas (C) with excimer UV is accelerated in a low temperature atmosphere and also the reactive gas (C) is not consumed in vain since it is not supplied to a region (A2) where no active photchemical reaction takes place, and therefore, a gas supplying source having a relatively small capacity may be sufficient for the excimer UV photo reactor. Accordingly, the above reactor can be used for practicing a photochemical reaction in an apparatus having simpler structure, at a lower temperature atmosphere and with safety.</p> |
申请公布号 |
WO0236259(A1) |
申请公布日期 |
2002.05.10 |
申请号 |
WO2001JP09314 |
申请日期 |
2001.10.24 |
申请人 |
SHIN-ETSU ENGINEERING CO., LTD.;OHNODA, TADATOMO;SAKAI, IKUO |
发明人 |
OHNODA, TADATOMO;SAKAI, IKUO |
分类号 |
B01J19/12;B08B7/00;C23C16/44;C23C16/455;C23C16/48;C23C16/54;(IPC1-7):B01J19/12;H01L21/302 |
主分类号 |
B01J19/12 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|