发明名称 EXCIMER UV PHOTO REACTOR
摘要 <p>An excimer UV photo reactor which has a reactive gas supplying means (1) for supplying a reactive gas (C) only to an active region (A1) on a body (A) to be irradiated. In the excimer UV photo reactor, a photochemical reaction of the reactive gas (C) with excimer UV is accelerated in a low temperature atmosphere and also the reactive gas (C) is not consumed in vain since it is not supplied to a region (A2) where no active photchemical reaction takes place, and therefore, a gas supplying source having a relatively small capacity may be sufficient for the excimer UV photo reactor. Accordingly, the above reactor can be used for practicing a photochemical reaction in an apparatus having simpler structure, at a lower temperature atmosphere and with safety.</p>
申请公布号 WO0236259(A1) 申请公布日期 2002.05.10
申请号 WO2001JP09314 申请日期 2001.10.24
申请人 SHIN-ETSU ENGINEERING CO., LTD.;OHNODA, TADATOMO;SAKAI, IKUO 发明人 OHNODA, TADATOMO;SAKAI, IKUO
分类号 B01J19/12;B08B7/00;C23C16/44;C23C16/455;C23C16/48;C23C16/54;(IPC1-7):B01J19/12;H01L21/302 主分类号 B01J19/12
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