RESIST DISCHARGE OPENING CLEANING METHOD AND APPARATUS, AND RESIST APPLYING METHOD AND APPARATUS

摘要

PROBLEM TO BE SOLVED: To form an accurate resist film over the entire surface of a substrate using a very small amount of resist liquid. SOLUTION: A resist discharge opening is exposed to an atomizable solvent made of a solvent that is non reactive to a resist material, and the resist material that adheres to an area near the resist discharge opening is dissolved and removed. By positively eliminating contamination, irregularities in film formation, mixture of particles, or the like can be prevented, when applying the resist, and at the same time the amount of coating can be made uniform.