| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device, capable of accurately correcting the deviations of a shape or a position of a pattern exposed or formed in two exposure steps, and to provide a semiconductor pattern automatic regulator. SOLUTION: The method for manufacturing the semiconductor device comprises a pattern measuring step (S3) of measuring the deviation of a first pattern and a second pattern by a pattern measuring unit 3, first patterning step (S1) of regulating the first pattern in the manufacturing step of the semiconductor device the next time, based on information sensed thereby, and a second patterning step (S2) having a low flexibility of accurately aligning the shape or the position of the first pattern for the second pattern. |
