| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method for measuring positions, capable of obtaining high measuring accuracy without lowering the throughput, to provide an aligner capable of accurately superposing and to further provide a method for manufacturing a device using the aligner. SOLUTION: The apparatus for measuring the position comprises at least four plate alignment sensors 20a to 20d, provided corresponding to first to forth quadrants R1 to R4 partitioned by a straight line L1, extending in the X-axis direction and a straight line L2, extending in the Y-axis direction through a center of a plate P to measure positional information of corresponding marks AM1 to AM4 based on lights obtained by illuminating the corresponding marks AM1 to AM4. with a detection light. The apparatus simultaneously measures the positional information of the X-axis direction and the Y-axis direction of the marks AM1 to AM4 formed in the first to fourth quadrants R1 to R4, by using four plate alignment sensors 20a to 20d. |
