POSITIVE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive resist composition having excellent sensitivity and resolution, hardly generating development residue or development defect and exhibiting excellent shape of pattern profile. SOLUTION: The positive resist composition contains a compound (A) generating an acid by the irradiation with an active ray or radiation, a resin (B) having a monocyclic or polycyclic alicyclic hydrocarbon structure in the main chain or the side chain and increasing the solubility in an alkali developer by the decomposition with the action of the acid and a compound (C) expressed by a specific structure.