| 摘要 |
PROBLEM TO BE SOLVED: To provide a film forming method by CVD, which is most favorable for easily and effectively predicting a suitable film-forming condition for an industrial production, by a CVD method of a type of using heat as an energy source for reaction, and an apparatus. SOLUTION: The CVD apparatus 10 employing laser as a heat energy source for heating a substrate 14 comprises, spot heating an irradiation position 15 along with sequentially changing the position 15 to be irradiated on the substrate 14, and also changing a condition of several film forming factors for forming a thin film on every changing the irradiation position 15.
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