发明名称 RADIATION-SENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a radiation-sensitive resist composition having superior resolving power and preservability and a radiation sensitive resist composition further having improved edge roughness. SOLUTION: Each of the radiation sensitive resist compositions contains a resin having a velocity of dissolution in an alkali developing solution increased by the action of an acid, a photo-acid generating agent, a solvent and a specified alicyclic or aromatic compound.
申请公布号 JP2002131916(A) 申请公布日期 2002.05.09
申请号 JP20000329214 申请日期 2000.10.27
申请人 FUJI PHOTO FILM CO LTD 发明人 TAKAHASHI AKIRA;YASUNAMI SHOICHIRO
分类号 G03F7/039;C08K5/00;C08K5/17;C08K5/34;C08L101/00;G03F7/004;H01L21/027 主分类号 G03F7/039
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