发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a radiation-sensitive resist composition having superior resolving power and preservability and a radiation sensitive resist composition further having improved edge roughness. SOLUTION: Each of the radiation sensitive resist compositions contains a resin having a velocity of dissolution in an alkali developing solution increased by the action of an acid, a photo-acid generating agent, a solvent and a specified alicyclic or aromatic compound. |
申请公布号 |
JP2002131916(A) |
申请公布日期 |
2002.05.09 |
申请号 |
JP20000329214 |
申请日期 |
2000.10.27 |
申请人 |
FUJI PHOTO FILM CO LTD |
发明人 |
TAKAHASHI AKIRA;YASUNAMI SHOICHIRO |
分类号 |
G03F7/039;C08K5/00;C08K5/17;C08K5/34;C08L101/00;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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