POSITIVE RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive resist composition which is enhanced in resolving power, reduced in residue on development and improved in process admissibility such as a margin for exposure and a focal depth in lithography using a short- wavelength light source for exposure capable of ultra-microfabrication and a positive chemical amplification resist. SOLUTION: The positive resist composition contains (A) at least one of compound which generates a specific sulfonic acid by the irradiation of active light and (B) a resin having a group which is decomposed by the action of an acid to increase solubility in an alkali developing solution.