| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a polysilane copolymer which is excellent in formability to a thin film, mechanical strengths and a wear resistance, simply, safely and at low cost. SOLUTION: A polysilane random or block copolymer is produced by introducing a halosilane compound and a vinyl compound into the reaction system and by reacting them with the aid of a magnesium metal component in an aprotic solvent in the presence of a metal halide. The lithium compound may be a lithium halide and the metal halide may be a polyvalent metal halide.
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