| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for cleaning a substrate holding part or the like, which results in forming a deposition film with constantly uniform film thickness and film quality to sharply reduce image defects, through removing a residue deposited on the base-substance holding part or an auxiliary part or the like with an etching treatment after forming the deposition film. SOLUTION: The method for cleaning the substrate holding part or the like having an etching process for removing the deposited film adhered to the substrate holding part or the auxiliary part or the like, which holds the above substrate for forming the deposition film thereon, after forming the deposition film on the base substance in a vacuum reaction vessel, comprises sequentially a cleaning process, a drying process, and a cooling process, following the above etching process, to remove the residue in the above etching process.
|
