METHOD OF PRODUCING HIGH ASPECT RATIO DOME BY VAPOR DEPOSITION

摘要

PROBLEM TO BE SOLVED: To provide an apparatus and method for preparing high aspect ratio domes employed to enhance aerodynamic performance in missiles and aircraft, and also for providing transmissive domes for infrared sensors used for navigation, targeting and guidance systems. SOLUTION: The apparatus is employed in chemical vapor deposition furnaces for chemical deposition of materials on mandrels to form domes. The mandrels of the apparatus are arranged so that the flow of gaseous reactants does not impinge on the mandrels. The reactants diffuse onto the mandrels to form domes with high aspect ratios.