发明名称 Material for copper electroplating, method for manufacturing same and copper electroplating method
摘要 A copper electroplating material capable of exhibiting increased easy-dissolution properties, to thereby minimize formation of an insoluble residue. Basic copper carbonate is formed in a reaction tank by deposition and heated to a temperature of between 250° C. and 800° C. and preferably between 350° C. and 600° C. in an atmosphere which does not form a reducing atmosphere which does not form a reducing atmosphere, to thereby be subjected to thermal decomposition, resulting in providing easily soluble copper oxide. The copper oxide is washed with water and dewatered using, for example, a centrifugal separator. Then, the copper oxide is dried.
申请公布号 US2002053518(A1) 申请公布日期 2002.05.09
申请号 US20010944344 申请日期 2001.09.04
申请人 TSURUMI SODA CO., LTD. 发明人 MATSUKI SHIROSHI;AKIYAMA KAZUNORI
分类号 C01G3/00;C01G3/02;C25D3/38;C25D21/14;(IPC1-7):C25D3/38 主分类号 C01G3/00
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