POLYIMIDE PRECURSOR COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive composition less liable to affect a base used in the formation of a protective film, an interlayer dielectric or the like and excellent in coating performance. SOLUTION: The photosensitive composition containing (A) a polyamic acid ester of formula [I] (where X is a tetravalent organic group; Y is a divalent organic group; and R and R' are each a monovalent group containing an olefinic double bond), (B) a photopolymerization initiator and (C) a solvent having a structure of formula [II] is produced.