| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method for forming a thin film, which accurately control a substrate temperature giving a big influence on performance of a formed thin film at a predetermined value, and are suitable for mass production with a little performance variation. SOLUTION: A material supplying part for thin film consisting of a material for thin film and a hearth for supporting it comprises having a mechanism for cooling on a basis of flowing a cooling fluid, in the hearth, detecting a fluid temperature (Tin) of the cooling fluid in front of the hearth and a fluid temperature (Tout) at an exit, and controlling a substrate temperature during formation of the thin film at the predetermined temperature, by sending a temperature signal based on the difference of the temperature Tout and Tin to a substrate heating apparatus, to form the thin film with a constant performance.
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