发明名称 MULTILAYER REFLECTION MIRROR AND EUV EXPOSURING DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent unintentional diffraction phenomena due to uneven state of the surface at a boundary removed with a method removing one by one layer from the surface of multilayer film for specifically shaping a reflection wave front of a multilayer film reflection mirror. SOLUTION: For removing a layer, a method not causing a level difference at the boundary is used. More specifically, a small tool method or an ion beam fabrication method is applied.
申请公布号 JP2002131487(A) 申请公布日期 2002.05.09
申请号 JP20000321031 申请日期 2000.10.20
申请人 NIKON CORP 发明人 MURAKAMI KATSUHIKO
分类号 G21K1/06;G02B5/08;G03F7/20;G21K5/02;H01L21/027;(IPC1-7):G21K1/06 主分类号 G21K1/06
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